Yusheng Xiong
Glasgow
Summary
Highly motivated final-year PhD student in Electronics and Nanoscale Engineering at the University of Glasgow with over five years of hands-on cleanroom experience at the James Watt Nanofabrication Centre (JWNC). Highly proficient in semiconductor fabrication techniques including plasma etching, ebeam and photolithography, and thin film deposition with expert-level knowledge. Eager to contribute to strategic objectives, develop novel approaches, manage complex cleanroom processes, and collaborate with interdisciplinary teams to advance plasma processing technologies.
Overview
9
9
years of post-secondary education
Education
Doctor of Philosophy - Electronics and Nanoscale Engineering
University of Glasgow
Glasgow 02.2021 - 09.2025
Master of Science - Electronics and Electrical Engineering
University of Glasgow
Glasgow 09.2019 - 12.2020
Bachelor of Science - Electronic Engineering
Bangor University
Bangor 09.2016 - 07.2019
Skills
- Reactive Ion Etch
- Inductively Coupled Plasma
- Ebeam and Photolithography
- Scanning Electron Microscopy
- Matlab and Python programming
- Communication and networking
- Supervision and leadership
Accomplishments
- Robust process developed for 25nm ultra-short transistor channel fabrication (2025)
- Successfully fabricated the first fully functional silicon quantum transistor in the lab group (2024)
- University of Glasgow PhD Scholarship (2021)
- Bangor University Scholarship (2018)
- Bangor University Scholarship (2017)
Timeline
Doctor of Philosophy - Electronics and Nanoscale Engineering
University of Glasgow
02.2021 - 09.2025
Master of Science - Electronics and Electrical Engineering
University of Glasgow
09.2019 - 12.2020
Bachelor of Science - Electronic Engineering
Bangor University
09.2016 - 07.2019
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